Media type: E-Article Title: Optimal regime for forming topological patterns when processing films with laser radiation Contributor: Veĭko, V P; Karpman, I M; Libenson, M N; Yakovlev, E B imprint: IOP Publishing, 1982 Published in: Soviet Journal of Quantum Electronics Language: Not determined DOI: 10.1070/qe1982v012n11abeh006087 ISSN: 0049-1748 Keywords: General Engineering Origination: Footnote: