Media type: E-Article Title: Ion beam etching of multilevel masking layers written by two-photon lithography Contributor: Schmitt, Jana; Hengsbach, Stefan; Bade, Klaus; Wallrabe, Ulrike; Völklein, Friedemann imprint: IOP Publishing, 2017 Published in: Journal of Micromechanics and Microengineering Language: Not determined DOI: 10.1088/1361-6439/aa6e8f ISSN: 0960-1317; 1361-6439 Keywords: Electrical and Electronic Engineering ; Mechanical Engineering ; Mechanics of Materials ; Electronic, Optical and Magnetic Materials Origination: Footnote: