• Media type: E-Article
  • Title: Study on the rheological properties and polishing properties of SiO2@CI composite particle for sapphire wafer
  • Contributor: Pan, Jisheng; Chen, Zhijun; Yan, Qiusheng
  • Published: IOP Publishing, 2020
  • Published in: Smart Materials and Structures, 29 (2020) 11, Seite 114003
  • Language: Not determined
  • DOI: 10.1088/1361-665x/abb21c
  • ISSN: 0964-1726; 1361-665X
  • Origination:
  • Footnote:
  • Description: <jats:title>Abstract</jats:title> <jats:p>To study the rheological properties and polishing performance of magnetorheological fluids (MRFs) prepared with SiO<jats:sub>2</jats:sub>@carbonyl iron (CI) core-shell particles, SiO<jats:sub>2</jats:sub>@CI core-shell particles with different shell thicknesses were synthesized by an improved Stöber method controlling the amount of tetraethyl orthosilicate (TEOS). Then, four types of MRFs which dispersed with core-shell particles with thin shells, core-shell particles with thick shells, SiO<jats:sub>2</jats:sub> particles, or carbonyl iron were prepared for sapphire polishing. The results show that the rheological properties of MRF based on thicker shell SiO<jats:sub>2</jats:sub>@CI are enhanced compared to those of MRFs prepared by dispersing abrasive and CI. Comparing with other MRFs, sapphire can obtain better surface quality when using thicker shell SiO<jats:sub>2</jats:sub>@CI. The MRF fabricated by SiO<jats:sub>2</jats:sub>@CI core-shell particles can increase the contact area between the abrasive and the workpiece and enhance the contact stress, which improves the solid-phase reaction rate and mechanical removal efficiency of silica and sapphire, thereby improve the polishing efficiency.</jats:p>