• Media type: E-Article
  • Title: Plasmatechnik 4.0 : Stand der Technik, Entwicklungen und Erwartungen : Stand der Technik, Entwicklungen und Erwartungen
  • Contributor: Ferse, Katrin; Awakowicz, Peter; Beck, Uwe; Brand, Carola; Engelstädter, Jan Peter; Fiedler, Wilfriede; Foest, Rüdiger; Kersten, Holger; Lemmer, Oliver; Schäfer, Hans-Jürgen; Schwock, Alexander
  • Published: Wiley, 2018
  • Published in: Vakuum in Forschung und Praxis, 30 (2018) 6, Seite 34-39
  • Language: German
  • DOI: 10.1002/vipr.201800697
  • ISSN: 0947-076X; 1522-2454
  • Keywords: Surfaces, Coatings and Films ; Condensed Matter Physics
  • Origination:
  • Footnote:
  • Description: SummaryPlasma Technology 4.0 – State of the art, developments and expectationsNew technologies offer great opportunities for plasma applications. This fact is also known by the players in surface technology who deal intensively with these current topics. In everyday practice there are already good examples of integrable IoT services for process technology right through to networked business processes. The expectations are high and the concerns as well. Beginning with social aspects of the man‐machine interface through standardization to cyber security there are numerous topics that are discussed in the community. The potential of the plasma technology drives the stakeholders and inspires to more and more new research projects for intelligent process diagnostics and process control.