• Media type: E-Article
  • Title: Structural changes in poly(methyl methacrylate) during deep‐etch X‐ray synchrotron radiation lithography. Part I: Degradation of the molar mass
  • Contributor: Schmalz, Olaf; Hess, Michael; Kosfeld, Robert
  • imprint: Wiley, 1996
  • Published in: Die Angewandte Makromolekulare Chemie
  • Language: English
  • DOI: 10.1002/apmc.1996.052390107
  • ISSN: 0003-3146; 1522-9505
  • Keywords: General Materials Science
  • Origination:
  • Footnote:
  • Description: <jats:title>Abstract</jats:title><jats:p>Poly(methyl methacrylate) is a preferred material used in X‐ray lithography. One effect observed after irradiation is a change of its chemical structure, combined with a decrease of the molar mass. This was analysed quantitatively using size exclusion chromatography combined with multi‐angle laser‐light scattering. Based on a kinetic model, an equation was derived which gives a satisfactory description of the dependence of the molar mass on the radiation dose.</jats:p>