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Gruska, B.; Wandel, K.

The influence of temperature and pressure on the structure of remote plasma enhanced chemically vapor deposited SiO2 investigated by spectroscopic ellipsometry

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  • Media type: E-Article
  • Title: The influence of temperature and pressure on the structure of remote plasma enhanced chemically vapor deposited SiO2 investigated by spectroscopic ellipsometry
  • Contributor: Gruska, B.; Wandel, K.
  • imprint: Elsevier BV, 1993
  • Published in: Thin Solid Films
  • Language: English
  • DOI: 10.1016/0040-6090(93)90099-b
  • ISSN: 0040-6090
  • Keywords: Materials Chemistry ; Metals and Alloys ; Surfaces, Coatings and Films ; Surfaces and Interfaces ; Electronic, Optical and Magnetic Materials
  • Origination:
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