Media type: E-Article Title: Influence of the dose distribution on resist development properties Contributor: Knyazev, M.A.; Svintsov, A.A.; Zaitsev, S.I. imprint: Elsevier BV, 2010 Published in: Microelectronic Engineering Language: English DOI: 10.1016/j.mee.2009.12.044 ISSN: 0167-9317 Keywords: Electrical and Electronic Engineering ; Surfaces, Coatings and Films ; Condensed Matter Physics ; Atomic and Molecular Physics, and Optics ; Electronic, Optical and Magnetic Materials Origination: Footnote: