Media type: E-Article Title: Etch characteristics of IrMn thin films using an inductively coupled plasma of CH3OH/Ar Contributor: Xiao, Yu Bin; Kim, Eun Ho; Kong, Seon Mi; Chung, Chee Won Published: Elsevier BV, 2011 Published in: Thin Solid Films, 519 (2011) 23, Seite 8229-8234 Language: English DOI: 10.1016/j.tsf.2011.03.099 ISSN: 0040-6090 Keywords: Materials Chemistry ; Metals and Alloys ; Surfaces, Coatings and Films ; Surfaces and Interfaces ; Electronic, Optical and Magnetic Materials Origination: Footnote: