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Diokh, Therese; Le-Roux, Elise; Jeannot, Simon; Cagli, Carlo; Jousseaume, Vincent; Nodin, Jean-François; Gros-Jean, Mickaël; Gaumer, Clement; Mellier, Maxime; Cluzel, Jacques; Carabasse, Catherine; Candelier, Philippe; De Salvo, Barbara

Study of resistive random access memory based on TiN/TaOx/TiN integrated into a 65nm advanced complementary metal oxide semiconductor technology

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  • Media type: E-Article
  • Title: Study of resistive random access memory based on TiN/TaOx/TiN integrated into a 65nm advanced complementary metal oxide semiconductor technology
  • Contributor: Diokh, Therese; Le-Roux, Elise; Jeannot, Simon; Cagli, Carlo; Jousseaume, Vincent; Nodin, Jean-François; Gros-Jean, Mickaël; Gaumer, Clement; Mellier, Maxime; Cluzel, Jacques; Carabasse, Catherine; Candelier, Philippe; De Salvo, Barbara
  • Published: Elsevier BV, 2013
  • Published in: Thin Solid Films, 533 (2013), Seite 24-28
  • Language: English
  • DOI: 10.1016/j.tsf.2012.11.124
  • ISSN: 0040-6090
  • Origination:
  • Footnote: