Media type: E-Article Title: Bottom Anti-Reflective Coatings for DUV lithography: Determination of optimum thermal process conditions Contributor: Schiltz, A.; Terpan, J-F.; Amblard, G.; Paniez, P.J. imprint: Elsevier BV, 1997 Published in: Microelectronic Engineering Language: English DOI: 10.1016/s0167-9317(96)00087-1 ISSN: 0167-9317 Keywords: Electrical and Electronic Engineering ; Surfaces, Coatings and Films ; Condensed Matter Physics ; Atomic and Molecular Physics, and Optics ; Electronic, Optical and Magnetic Materials Origination: Footnote: