Media type: E-Article Title: Quantum Yields of Photoacid Generation in 193-nm Chemically Amplified Resists by Fluorescence Imaging Spectroscopy Contributor: Ray, Krishanu; Mason, Michael D.; Grober, Robert D.; Pohlers, Gerd; Staford, Carolyne; Cameron, James F. imprint: American Chemical Society (ACS), 2004 Published in: Chemistry of Materials Language: English DOI: 10.1021/cm049448f ISSN: 0897-4756; 1520-5002 Keywords: Materials Chemistry ; General Chemical Engineering ; General Chemistry Origination: Footnote: