Media type: E-Article Title: Controlling the Atomic Layer Deposition of Titanium Dioxide on Silicon: Dependence on Surface Termination Contributor: McDonnell, Stephen; Longo, Roberto C.; Seitz, Oliver; Ballard, Josh B.; Mordi, Greg; Dick, Don; Owen, James H. G.; Randall, John N.; Kim, Jiyoung; Chabal, Yves J.; Cho, Kyeongjae; Wallace, Robert M. imprint: American Chemical Society (ACS), 2013 Published in: The Journal of Physical Chemistry C Language: English DOI: 10.1021/jp4060022 ISSN: 1932-7447; 1932-7455 Keywords: Surfaces, Coatings and Films ; Physical and Theoretical Chemistry ; General Energy ; Electronic, Optical and Magnetic Materials Origination: Footnote: