Feiring, Andrew E.;
Crawford, Michael K.;
Farnham, William B.;
Feldman, Jerald;
French, Roger H.;
Junk, Christopher P.;
Leffew, Kenneth W.;
Petrov, Viacheslav A.;
Qiu, Weiming;
Schadt, Frank L.;
Tran, Hoang V.;
Zumsteg, Fredrick C.
New Amorphous Fluoropolymers of Tetrafluoroethylene with Fluorinated and Non-Fluorinated Tricyclononenes. Semiconductor Photoresists for Imaging at 157 and 193 nm
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Media type:
E-Article
Title:
New Amorphous Fluoropolymers of Tetrafluoroethylene with Fluorinated and Non-Fluorinated Tricyclononenes. Semiconductor Photoresists for Imaging at 157 and 193 nm
Contributor:
Feiring, Andrew E.;
Crawford, Michael K.;
Farnham, William B.;
Feldman, Jerald;
French, Roger H.;
Junk, Christopher P.;
Leffew, Kenneth W.;
Petrov, Viacheslav A.;
Qiu, Weiming;
Schadt, Frank L.;
Tran, Hoang V.;
Zumsteg, Fredrick C.