Media type: E-Article Title: Solid state: Fast electron-beam lithography: High blanking speeds may make this new system a serious challenger in producing submicrometer ICs Contributor: Eidson, John C imprint: Institute of Electrical and Electronics Engineers (IEEE), 1981 Published in: IEEE Spectrum Language: Not determined DOI: 10.1109/mspec.1981.6369754 ISSN: 0018-9235; 1939-9340 Keywords: Electrical and Electronic Engineering Origination: Footnote: