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Chen, Jerry X.; Riddick, John; Lamantia, Matt J.; Zerrade, Azeddine; Henderson, Robert K.; Hughes, Greg P.; Tabery, Cyrus E.; Phan, Khoi A.; Spence, Chris A.; Winder, Amy A.; Stanton, William A.; Delarosa, Eugene A.; Maltabes, John G.; Philbin, Cecilia E.; Litt, Lloyd C.; Vacca, Anthony; Pomeroy, Scott

ArF (193-nm) alternating aperture PSM quartz defect repair and printability for 100-nm node

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  • Media type: Electronic Conference Proceeding
  • Title: ArF (193-nm) alternating aperture PSM quartz defect repair and printability for 100-nm node
  • Contributor: Chen, Jerry X.; Riddick, John; Lamantia, Matt J.; Zerrade, Azeddine; Henderson, Robert K.; Hughes, Greg P.; Tabery, Cyrus E.; Phan, Khoi A.; Spence, Chris A.; Winder, Amy A.; Stanton, William A.; Delarosa, Eugene A.; Maltabes, John G.; Philbin, Cecilia E.; Litt, Lloyd C.; Vacca, Anthony; Pomeroy, Scott
  • Published: SPIE, 2002
  • Published in: 21st Annual BACUS Symposium on Photomask Technology (2002)
  • Extent:
  • Language: Not determined
  • DOI: 10.1117/12.458362
  • ISSN: 0277-786X
  • Origination:
  • Footnote: