Media type: Electronic Conference Proceeding Title: Calibration and validation of projection lithography in chemically amplified resist systems using fluorescence imaging Contributor: Mason, Michael D.; Ray, Krishanu; Feke, Gilbert D.; Grober, Robert D.; Pohlers, Gerd; Cameron, James F. imprint: SPIE, 2003 Published in: SPIE Proceedings Extent: Language: Not determined DOI: 10.1117/12.483753 ISSN: 0277-786X Origination: Footnote: