Media type: Electronic Conference Proceeding Title: Qualification of a low-cost high-quality reticle process for 90-nm contact layers Contributor: Strozewski, Kirk J.; Perez, Joe; Carter, Rusty; Kiefer, Robert; Jackson, Curt; MacDonald, Susan; Kalk, Franklin imprint: SPIE, 2004 Published in: Metrology, Inspection, and Process Control for Microlithography XVIII Extent: Language: Not determined DOI: 10.1117/12.536712 ISSN: 0277-786X Origination: Footnote: