Media type: Electronic Conference Proceeding Title: Resist component leaching in 193-nm immersion lithography Contributor: Dammel, Ralph R.; Pawlowski, Georg; Romano, Andrew; Houlihan, Frank M.; Kim, Woo-Kyu; Sakamuri, Raj; Abdallah, David imprint: SPIE, 2005 Published in: SPIE Proceedings Extent: Language: Not determined DOI: 10.1117/12.600782 ISSN: 0277-786X Origination: Footnote: