Media type: Electronic Conference Proceeding Title: Mask defect printing mechanisms for future lithography generations Contributor: Erdmann, Andreas; Graf, Thomas; Bubke, Karsten; Höllein, Ingo; Teuber, Silvio Published: SPIE, 2006 Published in: SPIE Proceedings (2006) Extent: Language: Not determined DOI: 10.1117/12.655558 ISSN: 0277-786X Origination: Footnote: