Media type: Electronic Conference Proceeding Title: Overcoming pattern collapse on e-beam and EUV lithography Contributor: Jouve, A.; Simon, J.; Pikon, A.; Solak, H.; Vannuffel, C.; Tortai, J.-H. imprint: SPIE, 2006 Published in: SPIE Proceedings Extent: Language: Not determined DOI: 10.1117/12.656400 ISSN: 0277-786X Origination: Footnote: