Media type: Electronic Conference Proceeding Title: Direct photo-etching of PMMA by focused EUV radiation from a compact laser plasma source Contributor: Barkusky, Frank; Bayer, Armin; Peth, Christian; Mann, Klaus Published: SPIE, 2008 Published in: SPIE Proceedings (2008) Extent: Language: Not determined DOI: 10.1117/12.762553 ISSN: 0277-786X Origination: Footnote: