Media type: Electronic Conference Proceeding Title: Demonstration of 22nm SRAM features with patternable hafnium oxide-based resist material using electron-beam lithography Contributor: Thrun, Xaver; Choi, Kang-Hoon; Freitag, Martin; Grenville, Andrew; Gutsch, Manuela; Hohle, Christoph; Stowers, Jason K.; Bartha, Johann W. imprint: SPIE, 2012 Published in: SPIE Proceedings Extent: Language: Not determined DOI: 10.1117/12.917814 ISSN: 0277-786X Origination: Footnote: