Media type: Electronic Conference Proceeding Title: Optimization method of photolithography process by means of atomic force microscopy Contributor: Sierakowski, Andrzej; Janus, Paweł; Kopiec, Daniel; Nieradka, Konrad; Domanski, Krzysztof; Grabiec, Piotr; Gotszalk, Teodor imprint: SPIE, 2012 Published in: SPIE Proceedings Extent: Language: Not determined DOI: 10.1117/12.918024 ISSN: 0277-786X Origination: Footnote: