Media type: Electronic Conference Proceeding Title: Mask-induced best-focus-shifts in DUV and EUV lithography Contributor: Erdmann, Andreas; Evanschitzky, Peter; Neumann, Jens Timo; Gräupner, Paul imprint: SPIE, 2015 Published in: SPIE Proceedings Extent: Language: Not determined DOI: 10.1117/12.2086346 ISSN: 0277-786X Origination: Footnote: