Media type: Electronic Conference Proceeding Title: Acid diffusion in a chemically amplified negative i-line photoresist Contributor: Connolly, Judy; Chen, K. Rex; Kwong, Ranee W.; Lawson, Margaret C.; Linehan, Leo L.; Moreau, Wayne M. imprint: SPIE, 1998 Published in: SPIE Proceedings Extent: Language: Not determined DOI: 10.1117/12.312474 ISSN: 0277-786X Origination: Footnote: