Varanasi, Pushkara R.;
Jordhamo, George M.;
Lawson, Margaret C.;
Chen, K. Rex;
Brunsvold, William R.;
Hughes, Timothy;
Keller, Robin;
Khojasteh, Mahmoud;
Li, W.;
Allen, Robert D.;
Ito, Hiroshi;
Opitz, Juliann;
Truong, Hoa D.;
Wallow, Thomas I.
Progress toward developing high-performance 193-nm single-layer positive resist based on functionalized poly(norbornenes)
You can manage bookmarks using lists, please log in to your user account for this.
Media type:
Electronic Conference Proceeding
Title:
Progress toward developing high-performance 193-nm single-layer positive resist based on functionalized poly(norbornenes)
Contributor:
Varanasi, Pushkara R.;
Jordhamo, George M.;
Lawson, Margaret C.;
Chen, K. Rex;
Brunsvold, William R.;
Hughes, Timothy;
Keller, Robin;
Khojasteh, Mahmoud;
Li, W.;
Allen, Robert D.;
Ito, Hiroshi;
Opitz, Juliann;
Truong, Hoa D.;
Wallow, Thomas I.
imprint:
SPIE, 2000
Published in:Advances in Resist Technology and Processing XVII