Media type: Electronic Conference Proceeding Title: Toward controlled resist line-edge roughness: material origin of line-edge roughness in chemically amplified positive-tone resists Contributor: Lin, Qinghuang; Sooriyakumaran, Ratnam; Huang, Wu-Song imprint: SPIE, 2000 Published in: Advances in Resist Technology and Processing XVII Extent: Language: Not determined DOI: 10.1117/12.388307 ISSN: 0277-786X Origination: Footnote: