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Medientyp: E-Artikel; Sonstige Veröffentlichung Titel: Generation of ultrasmall nanostructures in oxide layers assisted by self-organization Beteiligte: Block, T. [VerfasserIn]; Pfnür, Herbert [VerfasserIn] Erschienen: College Park, MD : American Institute of Physics, 2008 Erschienen in: Journal of Applied Physics 103 (2008), Nr. 6 Ausgabe: published Version Sprache: Englisch DOI: https://doi.org/10.15488/2760; https://doi.org/10.1063/1.2896413 Schlagwörter: Anisotropy ; Ultrasmall nanostructures ; Self-organization ; Ultrasmall structures ; Ultrathin films ; Silica ; Nanostructures ; Electron microscopy ; Auger excitation process ; Auger electron spectroscopy ; Electron beam lithography Entstehung: Anmerkungen: Diese Datenquelle enthält auch Bestandsnachweise, die nicht zu einem Volltext führen. Beschreibung: We explored the structural limits of unconventional electron-beam lithography by directly writing with an electron beam into ultrathin SiO2 films. The obtained structures were analyzed by tunneling microscopy. The Auger excitation process (Knotek-Feibelman mechanism) necessary for electron-stimulated oxygen desorption allows generation of ultrasmall structures. The subsequent processing step combines thermal desorption of the remaining monoxide and simultaneous etching promoted by thermally activated silicon atoms, which turns out to be a strongly anisotropic process close to step edges. Applying this combination of processes to a regularly stepped Si(557) sample, linewidths close to the resolution of the electron microscope of 5 nm were obtained. © 2008 American Institute of Physics. Zugangsstatus: Freier Zugang