• Medientyp: E-Artikel
  • Titel: Mechanism of strain relaxation by twisted nanocolumns revealed in AlGaN/GaN heterostructures
  • Beteiligte: Kladko, V.P. [VerfasserIn]; Kuchuk, A.V. [VerfasserIn]; Safryuk, N.V. [VerfasserIn]; Machulin, V.F. [VerfasserIn]; Belyaev, A.E. [VerfasserIn]; Hardtdegen, H. [VerfasserIn]; Vitusevich, S. A. [VerfasserIn]
  • Erschienen: American Institute of Physics, 2009
  • Erschienen in: Applied physics letters 95, 031907 (2009). doi:10.1063/1.3184569
  • Sprache: Englisch
  • DOI: https://doi.org/10.1063/1.3184569
  • ISSN: 0003-6951
  • Schlagwörter: X-ray diffraction ; deformation ; dislocation density ; elasticity ; stress relaxation ; aluminium compounds ; III-V semiconductors ; gallium compounds ; MOCVD coatings
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  • Beschreibung: The structural properties of AlGaN/GaN heterostructures grown by metal organic chemical vapor deposition on sapphire substrates with different thicknesses were studied by high-resolution x-ray diffraction. The relation between the deformations and dislocation densities in the layer and substrate was established. The dependence of the system's curvature on the lattice mismatch, caused by different fractions of nanoblock twists with respect to the c-plane, was determined. A mechanism of elastic strain relaxation was proposed.
  • Zugangsstatus: Freier Zugang