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Medientyp:
E-Artikel
Titel:
Plasma polymerization at different positions in an asymmetric ethylene discharge
Beteiligte:
Trieschmann, Jan;
Hegemann, Dirk
Erschienen:
IOP Publishing, 2011
Erschienen in:
Journal of Physics D: Applied Physics, 44 (2011) 47, Seite 475201
Sprache:
Nicht zu entscheiden
DOI:
10.1088/0022-3727/44/47/475201
ISSN:
0022-3727;
1361-6463
Entstehung:
Hochschulschrift:
Anmerkungen:
Beschreibung:
<jats:p>The characteristics of plasma polymerization are investigated in an asymmetric, capacitively coupled plasma discharge. Here, the deposition in different plasma zones, i.e. on the driven electrode, within the plasma bulk and the plasma sheath as well as approximately at the plasma-sheath edge, is investigated. Principal expectations are perfectly met, though new interesting dependences of the obtained a-C : H coatings with respect to film properties and deposition rates are also found. That is, the deposition rates as measured on thin, small glass slides placed directly on the electrode are considerably higher than everywhere else in the plasma, yet only single-sided. In contrast, the deposition rates on the samples within the plasma are lowered depending on the exact placement, while a double-sided coating is obtained. Furthermore, film properties, such as the film density, are highly dependent on the sample placement in the plasma, which can even be higher under floating conditions. With simple physical arguments we are able to show the relations between the deposition rate and the energy input into the plasma as well as between the energy density during film growth and the film density itself.</jats:p>