Beschreibung:
SummaryFocussed Ion Beam ‐“Cutting Edge” Technology of Material AnalysisWith the focussed ion beam technique it is possible to sputter almost any material with nanometer scale accuracy and directly image or chemically analyze structures below the surface. The major advantage towards conventional cross‐section polishing is the high precision which allows to investigate even the smallest local defects. Applications of the focused ion beam even extend to the generation of complex nano structures. This article describes the operational modes, limits and constraints of the method and gives application examples from the field of material analytics.