Erschienen in:
Chemical Vapor Deposition, 16 (2010) 4-6, Seite 123-126
Sprache:
Englisch
DOI:
10.1002/cvde.200904280
ISSN:
0948-1907;
1521-3862
Entstehung:
Anmerkungen:
Beschreibung:
Bi2O3 films have been deposited on alumina particles by Fluidized Bed Chemical Vapor Deposition at atmospheric pressure, using bismuth triphenyl and oxygen as precursors. In the operating range tested, the presence of Bi on the whole particles has been evidenced by EDX, and the existence of the α and γ phases of Bi2O3 has been revealed consistently by Raman spectroscopy and by XRD.