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Medientyp:
E-Artikel
Titel:
Ion Flux Characteristics in Pulsed Dual Magnetron Discharges Used for Deposition of Photoactive TiO2 Films
Beteiligte:
Šícha, Jan;
Novák, Ondřej;
Vlček, Jaroslav;
Kudláček, Pavel
Erschienen:
Wiley, 2011
Erschienen in:Plasma Processes and Polymers
Sprache:
Englisch
DOI:
10.1002/ppap.201000131
ISSN:
1612-8850;
1612-8869
Entstehung:
Anmerkungen:
Beschreibung:
<jats:title>Abstract</jats:title><jats:p>Pulsed dc dual magnetron sputtering was used for preparation of photocatalytic crystalline TiO<jats:sub>2</jats:sub> films. The depositions were performed in an Ar + O<jats:sub>2</jats:sub> gas mixture at a total pressure of 0.9 Pa with an oxygen partial pressure of 0.2 Pa. The maximum substrate surface temperature was 160 °C. Both magnetrons operated in the same asymmetric bipolar mode at the repetition frequency of 100 kHz with a fixed 50% duty cycle, but their operations were shifted by a half of the period. Time‐averaged energy‐resolved mass spectroscopy was performed at a substrate position located 100 mm from the targets. A suppression of high‐energy ions in the flux onto the substrate resulted in a strong predominance of the highly photoactive crystalline anatase phase in the TiO<jats:sub>2</jats:sub> films. <jats:boxed-text content-type="graphic" position="anchor"><jats:graphic xmlns:xlink="http://www.w3.org/1999/xlink" mimetype="image/jpeg" position="anchor" specific-use="enlarged-web-image" xlink:href="graphic/mgra001.jpg"><jats:alt-text>magnified image</jats:alt-text></jats:graphic></jats:boxed-text></jats:p>