Beschreibung:
AbstractThe results of quantitative XPS analysis show a systematic change when the sample surface is covered by an overlayer. An accurate knowledge of the reduced thickness (x) of the total overlayer (e.g. oxide plus contamination) allows the quantification of such changes. The total reduced thickness (x) can be determined from the photoelectron signals of the substrate measured for different take‐off angles. It is found that this method can be applied for reduced thicknesses up to x = 3 with an error Δx estimated at less than 10%.