Argon ion multibeam nanopatterning of Ni–Cu inserts for injection molding

Medientyp: E-Artikel
Titel: Argon ion multibeam nanopatterning of Ni–Cu inserts for injection molding
Beteiligte: Koeck, Anton; Bruck, Roman; Wellenzohn, Markus; Hainberger, Rainer; Platzgummer, Elmar; Loeschner, Hans; Joechl, Peter; Eder-Kapl, Stefan; Ebm, Christoph; Czepl, Peter; Kaiblinger, Kurt; Pipelka, Friedrich; Letzkus, Florian; Irmscher, Mathias; Heitkamp, Bernd
Erschienen: American Vacuum Society, 2010
Erschienen in: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
Sprache: Englisch
DOI: 10.1116/1.3517643
ISSN: 2166-2746; 2166-2754
Schlagwörter: Materials Chemistry ; Electrical and Electronic Engineering ; Surfaces, Coatings and Films ; Process Chemistry and Technology ; Instrumentation ; Electronic, Optical and Magnetic Materials
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Beschreibung: <jats:p>The authors have successfully employed the charged particle nanopatterning (CHARPAN) technology for nanostructuring of a metal mold insert for a conventional injection molding machine. High-precision diamond-milled Ni–Cu mold inserts have been nanopatterned with 10 keV argon ion multibeam milling with feature sizes as small as 50 nm. A variety of structures such as circles, hexagons, and lines in different dimensions, with positive and negative shapes, have been fabricated in the metal mold. These structures have been successfully replicated in polymethylpentene samples by injection molding. To the authors’ best knowledge, the CHARPAN technology is one of the very few technologies that allow for resistless nanostructuring a field size of 25×25 μm2 into a metal mold in a single shot. This is of high importance for the practical injection molding fabrication of nanostructured polymer devices such as optical biosensors.</jats:p>

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