Beschreibung:
Millisecond annealing (MSA) has been developed over the last several years as a viableapproach to achieve the high electrical activation, limited diffusion and high abruptness needed forjunctions in the sub-65nm regime. This paper will provide an overview of the technology includingthe motivation, technology and some process results. Both main approaches for MSA, sub-meltlaser and flash lamp annealing will be discussed as well as the potential challenges to bring thesetechnologies into mainstream manufacturing.