Media type: Book; Thesis Title: Plasmagestützte chemische Gasphasenabscheidung mit hohen Raten Contributor: Steinke, Olaff [Author] imprint: 1995 Extent: 147 S.; graph. Darst Language: German RVK notation: UR 8000 : Plasmaphysik allgemein Keywords: Silicium > Amorpher Zustand > Dünne Schicht > CVD-Verfahren Origination: University thesis: Dresden, Techn. Univ., Diss., 1995 Footnote:
Departmental Library DrePunct – open access area Shelf-mark: UR 8000 S822 Item ID: 10066860 Status: Loanable
Central Library – stack Shelf-mark: 95 8 40606 001 Item ID: 10390120 Status: Loanable, place order > Ordering possible ‒ please log in