Der Zusammenhang zwischen dem Hochrate-Depositionsprozeß und den strukturellen sowie photoelektrischen Eigenschaften von a-Si:H-Schichten für die Anwendung in Dünnschichtsolarzellen

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Media type: Book; Thesis
Title: Der Zusammenhang zwischen dem Hochrate-Depositionsprozeß und den strukturellen sowie photoelektrischen Eigenschaften von a-Si:H-Schichten für die Anwendung in Dünnschichtsolarzellen
Contributor: Alhallani, Basem [Author]
imprint: 1996
Extent: 128 S.; graph. Darst
Language: German
RVK notation: ZN 4150 : Dünnschichttechnologie
Keywords: Hochschulschrift
Origination:
University thesis: Dresden, Techn. Univ., Diss., 1996
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