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Media type:
E-Article
Title:
Spectroscopic and Microscopic Investigations of Degradation Processes in Polymer Surface‐Near Regions During the Deposition of SiOx Films
Contributor:
Mitschker, Felix;
Dietrich, Jan;
Ozkaya, Berkem;
de los Arcos, Teresa;
Giner, Ignacio;
Awakowicz, Peter;
Grundmeier, Guido
Published:
Wiley, 2015
Published in:
Plasma Processes and Polymers, 12 (2015) 9, Seite 1002-1009
Language:
English
DOI:
10.1002/ppap.201500085
ISSN:
1612-8850;
1612-8869
Origination:
Footnote:
Description:
<jats:sec><jats:label /><jats:p>Atomic oxygen densities and fluences in a microwave plasma are determined by means of optical emission spectroscopy for different oxygen to hexamethyldisiloxane (HMDSO) ratios during deposition of SiO<jats:sub>x</jats:sub> and SiO<jats:sub>x</jats:sub>C<jats:sub>y</jats:sub>H<jats:sub>z</jats:sub> like coatings on molecularly defined organic surfaces. The plasma coatings are deposited on octadecanethiol self‐assembled monolayers that serve as a sensor layer. They are used for tracing the interfacial changes induced during plasma deposition as a function of the O<jats:sub>2</jats:sub> to HMDSO ratio and absolutely quantified atomic oxygen fluence. The interfacial chemical changes are monitored by means of polarization modulation IR reflection‐absorption spectroscopy. The data reveal that significant oxidative degradation of the sensor layer is reached for exposure to an atomic oxygen fluence of 1.0 · 10<jats:sup>22</jats:sup> m<jats:sup>−2</jats:sup>.<jats:inline-graphic xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="graphic/ppap201500085-gra-0001.png" xlink:title="ppap201500085-gra-0001" /></jats:p></jats:sec>