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Medientyp:
E-Artikel
Titel:
Spectroscopic and Microscopic Investigations of Degradation Processes in Polymer Surface‐Near Regions During the Deposition of SiOx Films
Beteiligte:
Mitschker, Felix;
Dietrich, Jan;
Ozkaya, Berkem;
de los Arcos, Teresa;
Giner, Ignacio;
Awakowicz, Peter;
Grundmeier, Guido
Erschienen:
Wiley, 2015
Erschienen in:Plasma Processes and Polymers
Sprache:
Englisch
DOI:
10.1002/ppap.201500085
ISSN:
1612-8850;
1612-8869
Entstehung:
Anmerkungen:
Beschreibung:
<jats:sec><jats:label /><jats:p>Atomic oxygen densities and fluences in a microwave plasma are determined by means of optical emission spectroscopy for different oxygen to hexamethyldisiloxane (HMDSO) ratios during deposition of SiO<jats:sub>x</jats:sub> and SiO<jats:sub>x</jats:sub>C<jats:sub>y</jats:sub>H<jats:sub>z</jats:sub> like coatings on molecularly defined organic surfaces. The plasma coatings are deposited on octadecanethiol self‐assembled monolayers that serve as a sensor layer. They are used for tracing the interfacial changes induced during plasma deposition as a function of the O<jats:sub>2</jats:sub> to HMDSO ratio and absolutely quantified atomic oxygen fluence. The interfacial chemical changes are monitored by means of polarization modulation IR reflection‐absorption spectroscopy. The data reveal that significant oxidative degradation of the sensor layer is reached for exposure to an atomic oxygen fluence of 1.0 · 10<jats:sup>22</jats:sup> m<jats:sup>−2</jats:sup>.<jats:inline-graphic xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="graphic/ppap201500085-gra-0001.png" xlink:title="ppap201500085-gra-0001" /></jats:p></jats:sec>