Media type: E-Article Title: Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Ar/Cl2/CH4 Plasma Chemistry Contributor: Landesman, Jean-Pierre; Cassidy, Daniel T.; Fouchier, Marc; Pargon, Erwine; Levallois, Christophe; Mokhtari, Merwan; Jimenez, Juan; Torres, Alfredo imprint: Springer Science and Business Media LLC, 2018 Published in: Journal of Electronic Materials Language: English DOI: 10.1007/s11664-018-6152-6 ISSN: 0361-5235; 1543-186X Keywords: Materials Chemistry ; Electrical and Electronic Engineering ; Condensed Matter Physics ; Electronic, Optical and Magnetic Materials Origination: Footnote: