Media type: E-Article Title: X-ray diffraction peak profile analysis of TiNx films prepared on silicon by reactive ion beam assisted deposition Contributor: Scardi, P.; Kothari, D.C.; Guzman, L. imprint: Elsevier BV, 1991 Published in: Thin Solid Films Language: English DOI: 10.1016/0040-6090(91)90273-z ISSN: 0040-6090 Keywords: Materials Chemistry ; Metals and Alloys ; Surfaces, Coatings and Films ; Surfaces and Interfaces ; Electronic, Optical and Magnetic Materials Origination: Footnote: