Media type: E-Article Title: Experimental threshold voltage fluctuations of 30 nm-NMOS-transistors manufactured by a lithography independent structure definition process Contributor: Horstmann, John T.; Kallis, Klaus T.; Fiedler, Horst L. imprint: Elsevier BV, 2009 Published in: Microelectronic Engineering Language: English DOI: 10.1016/j.mee.2008.11.048 ISSN: 0167-9317 Keywords: Electrical and Electronic Engineering ; Surfaces, Coatings and Films ; Condensed Matter Physics ; Atomic and Molecular Physics, and Optics ; Electronic, Optical and Magnetic Materials Origination: Footnote: