Media type: E-Article Title: Low-temperature ICPECVD of silicon nitride in SiH4–NH3–Ar discharges analyzed by spectroscopic ellipsometry and etch behavior in KOH and BHF Contributor: Wolf, R; Wandel, K; Gruska, B Published: Elsevier BV, 2001 Published in: Surface and Coatings Technology, 142-144 (2001), Seite 786-791 Language: English DOI: 10.1016/s0257-8972(01)01184-7 ISSN: 0257-8972 Origination: Footnote: