Media type: Electronic Conference Proceeding Title: Spectroscopic Ellipsometry based Scatterometry enabling 193nm Litho and Etch process control for the 110nm technology node and beyond Contributor: Hingst, Thomas; Marschner, Thomas; Moert, Manfred; Homilius, Jan; Guevremont, Marco; Hopkins, John; Elazami, Assim Published: SPIE, 2003 Published in: SPIE Proceedings (2003) Extent: Language: Not determined DOI: 10.1117/12.485011 ISSN: 0277-786X Origination: Footnote: