Media type: E-Article Title: Role of Bilayer Resist in 157 nm Lithography Contributor: Bowden, Murrae; Malik, Sanjay; Dilocker, Stephanie Published: Technical Association of Photopolymers, Japan, 2003 Published in: Journal of Photopolymer Science and Technology, 16 (2003) 4, Seite 629-636 Language: English DOI: 10.2494/photopolymer.16.629 ISSN: 0914-9244; 1349-6336 Origination: Footnote: Access State: Open Access