Skip to contents Baßler, Michael [Author] Eigenschaften elektrisch aktiver Zustände an der Grenzfläche SiC/SiO2 Books Close > Bookmarks You can manage bookmarks using lists, please log in to your user account for this. 2000 Pompl, Thomas [Author] Gateisolatoren für MOS-Feldeffekttransistoren Books Close > Bookmarks You can manage bookmarks using lists, please log in to your user account for this. 2000 Aslam, Mohammad [Author] Temperverhalten von Elektronen- und Loecherfangstellen in SiO2-Schichten von MOS-Strukturen : Fangstellen in MOS-Strukturen Books Close > Bookmarks You can manage bookmarks using lists, please log in to your user account for this. 1983 Bentarzi, Hamid [Author] Transport in metal-oxide-semiconductor structures : mobile ions effects on the oxide properties Books View online Schließen Close > Bookmarks You can manage bookmarks using lists, please log in to your user account for this. Berlin; Heidelberg [u.a.]: Springer, 2011 Published in: Engineering materials Wulf, Friedrich [Author] Einheitliches Modell zur Beschreibung der Generations- und Ausheilprozesse von Oxidladungen Qot und Grenzflächenzuständen Dit im Siliziumdioxid durch Stress Books Close > Bookmarks You can manage bookmarks using lists, please log in to your user account for this. Berlin: Hahn-Meitner-Inst., 1989 Published in: Hahn-Meitner-Institut: HMI-Berichte ; 465 Kopsalis, Ioannis [Author] Surface effects in segmented silicon sensors Books View online Schließen Close > Bookmarks You can manage bookmarks using lists, please log in to your user account for this. Hamburg: Deutsches Elektronen-Synchrotron, DESY, May 2017 Published in: Deutsches Elektronen-Synchrotron: DESY thesis ; 2017,22 Rebohle, Lars [Author]; Skorupa, Wolfgang [Author] Rare-earth implanted MOS devices for silicon photonics : microstructural, electrical and optoelectronic properties Books View online Schließen Close > Bookmarks You can manage bookmarks using lists, please log in to your user account for this. Berlin; Heidelberg [u.a.]: Springer, 2010 Published in: Springer series in materials science ; 142 Huff, Howard R. [Editor] High dielectric constant materials : VLSI MOSFET Applications; ... 31 tables Books View online Schließen Close > Bookmarks You can manage bookmarks using lists, please log in to your user account for this. Berlin; Heidelberg [u.a.]: Springer, 2005 Published in: Advanced microelectronics ; 16 Heidelberger, Gero [Author] Untersuchung von"high-k" Materialien als alternative Dielektrika für AlGaN/GaN-basierte Metall-Isolator-Halbleiter-Heterostruktur-Feldeffekt-Transistoren (MISHFET) = Investigation of "high-k" materials as alternative dielectrics for AlGaN/GaN-based metal-insulator-semiconductor heterostructure field effect transistors (MISHFET) Books View online Schließen > Access ... to E-book via Resolving system ... to E-book via German National Library Close > Bookmarks You can manage bookmarks using lists, please log in to your user account for this. Schmidt, Matthias [Author] Neuartige Metallelektroden und Dielektrika für die MOS-Technologie Books View online Schließen > Access ... to E-book via Resolving system ... to E-book via German National Library Close > Bookmarks You can manage bookmarks using lists, please log in to your user account for this. Huff, H.R [Other]; Gilmer, D.C [Other] High Dielectric Constant Materials : VLSI MOSFET Applications Books View online Schließen > Access ... to E-book via DOI (Volltext) Close > Bookmarks You can manage bookmarks using lists, please log in to your user account for this. Berlin, Heidelberg: Springer Berlin Heidelberg, 2005 Published in: Springer Series in Advanced Microelectronics ; 16 - SpringerLink ; Bücher Ludsteck, Alexandra [Author] Optimierung von Gate-Dielektrika für die MOS-Technologie Books View online Schließen > Access ... to E-book via Resolving system ... to E-book via German National Library Close > Bookmarks You can manage bookmarks using lists, please log in to your user account for this.
Baßler, Michael [Author] Eigenschaften elektrisch aktiver Zustände an der Grenzfläche SiC/SiO2 Books Close > Bookmarks You can manage bookmarks using lists, please log in to your user account for this. 2000
Pompl, Thomas [Author] Gateisolatoren für MOS-Feldeffekttransistoren Books Close > Bookmarks You can manage bookmarks using lists, please log in to your user account for this. 2000
Aslam, Mohammad [Author] Temperverhalten von Elektronen- und Loecherfangstellen in SiO2-Schichten von MOS-Strukturen : Fangstellen in MOS-Strukturen Books Close > Bookmarks You can manage bookmarks using lists, please log in to your user account for this. 1983
Bentarzi, Hamid [Author] Transport in metal-oxide-semiconductor structures : mobile ions effects on the oxide properties Books View online Schließen Close > Bookmarks You can manage bookmarks using lists, please log in to your user account for this. Berlin; Heidelberg [u.a.]: Springer, 2011 Published in: Engineering materials
Wulf, Friedrich [Author] Einheitliches Modell zur Beschreibung der Generations- und Ausheilprozesse von Oxidladungen Qot und Grenzflächenzuständen Dit im Siliziumdioxid durch Stress Books Close > Bookmarks You can manage bookmarks using lists, please log in to your user account for this. Berlin: Hahn-Meitner-Inst., 1989 Published in: Hahn-Meitner-Institut: HMI-Berichte ; 465
Kopsalis, Ioannis [Author] Surface effects in segmented silicon sensors Books View online Schließen Close > Bookmarks You can manage bookmarks using lists, please log in to your user account for this. Hamburg: Deutsches Elektronen-Synchrotron, DESY, May 2017 Published in: Deutsches Elektronen-Synchrotron: DESY thesis ; 2017,22
Rebohle, Lars [Author]; Skorupa, Wolfgang [Author] Rare-earth implanted MOS devices for silicon photonics : microstructural, electrical and optoelectronic properties Books View online Schließen Close > Bookmarks You can manage bookmarks using lists, please log in to your user account for this. Berlin; Heidelberg [u.a.]: Springer, 2010 Published in: Springer series in materials science ; 142
Huff, Howard R. [Editor] High dielectric constant materials : VLSI MOSFET Applications; ... 31 tables Books View online Schließen Close > Bookmarks You can manage bookmarks using lists, please log in to your user account for this. Berlin; Heidelberg [u.a.]: Springer, 2005 Published in: Advanced microelectronics ; 16
Heidelberger, Gero [Author] Untersuchung von"high-k" Materialien als alternative Dielektrika für AlGaN/GaN-basierte Metall-Isolator-Halbleiter-Heterostruktur-Feldeffekt-Transistoren (MISHFET) = Investigation of "high-k" materials as alternative dielectrics for AlGaN/GaN-based metal-insulator-semiconductor heterostructure field effect transistors (MISHFET) Books View online Schließen > Access ... to E-book via Resolving system ... to E-book via German National Library Close > Bookmarks You can manage bookmarks using lists, please log in to your user account for this.
Schmidt, Matthias [Author] Neuartige Metallelektroden und Dielektrika für die MOS-Technologie Books View online Schließen > Access ... to E-book via Resolving system ... to E-book via German National Library Close > Bookmarks You can manage bookmarks using lists, please log in to your user account for this.
Huff, H.R [Other]; Gilmer, D.C [Other] High Dielectric Constant Materials : VLSI MOSFET Applications Books View online Schließen > Access ... to E-book via DOI (Volltext) Close > Bookmarks You can manage bookmarks using lists, please log in to your user account for this. Berlin, Heidelberg: Springer Berlin Heidelberg, 2005 Published in: Springer Series in Advanced Microelectronics ; 16 - SpringerLink ; Bücher
Ludsteck, Alexandra [Author] Optimierung von Gate-Dielektrika für die MOS-Technologie Books View online Schließen > Access ... to E-book via Resolving system ... to E-book via German National Library Close > Bookmarks You can manage bookmarks using lists, please log in to your user account for this.
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