Anmerkungen:
"SPIE Digital Library."--Website. - Includes bibliographical references and index. - Restricted to subscribers or individual electronic text purchasers
Includes bibliographical references and index
Restricted to subscribers or individual electronic text purchasers
System requirements: Adobe Acrobat Reader
Mode of access: World Wide Web
Beschreibung:
Preface -- Introduction / Burn J. Lin, P. Rai-Choudhury -- 1. Optical lithography / Harry J. Levinson, William J. Arnold -- 2. Electron beam lithography / Mark A. McCord, Michael J. Rooks -- 3. X-ray lithography / Franco Cerrina -- 4. Deep-UV resist technology / Robert D. Allen, Willard E. Conley, Roderick R. Kunz -- 5. Photomask fabrication procedures and limitations / John G. Skinner, Timothy R. Groves, Anthony Novembre, Hans Pfeiffer, Rajeev Singh -- 6. Metrology methods in photolithography / Laurie J. Lauchlan, Diana Nyyssonen, Neal Sullivan -- 7. Optical lithography modeling / Andrew R. Neureuther, Chris A. Mack -- 8. Issues in nanolithography for quantum effect device manufacture / Martin C. Peckerar, F. Keith Perkins, Elizabeth A. Dobisz, Orest J. Glembocki -- Index
Preface -- Introduction / Burn J. Lin, P. Rai-Choudhury -- 1. Optical lithography / Harry J. Levinson, William J. Arnold -- 2. Electron beam lithography / Mark A. McCord, Michael J. Rooks -- 3. X-ray lithography / Franco Cerrina -- 4. Deep-UV resist technology / Robert D. Allen, Willard E. Conley, Roderick R. Kunz -- 5. Photomask fabrication procedures and limitations / John G. Skinner, Timothy R. Groves, Anthony Novembre, Hans Pfeiffer, Rajeev Singh -- 6. Metrology methods in photolithography / Laurie J. Lauchlan, Diana Nyyssonen, Neal Sullivan -- 7. Optical lithography modeling / Andrew R. Neureuther, Chris A. Mack -- 8. Issues in nanolithography for quantum effect device manufacture / Martin C. Peckerar, F. Keith Perkins, Elizabeth A. Dobisz, Orest J. Glembocki -- Index