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Behringer, Uwe [Editor] ; European Conference EMC on Mask Technology for Integrated Circuits and Micro-Components 16 1999 München, Gesellschaft Mikroelektronik, Mikro- und Feinwerktechnik

16th European Conference EMC on Mask Technology for Integrated Circuits and Micro-Components '99 : lectures held at the GMM conference, November 15 - 16, 1999 in Munich, Germany

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Berlin; Offenbach: VDE-Verl., 1999

Published in: Gesellschaft Mikroelektronik, Mikro- und Feinwerktechnik: GMM-Fachbericht ; 30
Behringer, Uwe [Editor] ; EMC 17 2000 München Gesellschaft Mikroelektronik, Mikro- und Feinwerktechnik

EMC 2000 : lectures held at the GMM conference, November 13 - 14, 2000 in Munich-Unterhaching, Germany

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Berlin; Offenbach: VDE-Verl., 2000

Published in: Gesellschaft Mikroelektronik, Mikro- und Feinwerktechnik: GMM-Fachbericht ; 32
Behringer, Uwe [Editor] ; Gesellschaft Mikroelektronik, Mikro- und Feinwerktechnik, European Conference on Mask Technology for Integrated Circuits and Micro-Components 15 1998 München

Mask technology for integrated circuits and micro-components '98 : lectures held at the GMM-conference, November 16 - 17, 1998 in Munich, Germany

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Berlin; Offenbach: VDE-Verl., 1998

Published in: Gesellschaft Mikroelektronik, Mikro- und Feinwerktechnik: GMM-Fachbericht ; 25
Behringer, Uwe [Other]

Vakuumbeschichtung / 2, Verfahren und Anlagen / Uwe Behringer

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Düsseldorf: VDI-Verl., 1995

Published in: Vakuumbeschichtung / Hrsg.: Gerhard Kienel ... ; 2
Behringer, Uwe [Other]

Vakuumbeschichtung / 4, Anwendungen : Teil 1. Vergleich der verwendeten Verfahren - elektrische Widerstandsschichten - supraleitende Schichten - dünne Schichten für Optik, Mikroelektronik, Optoelektronik, Mikromechanik - Solarzellen / Uwe Behringer

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Düsseldorf: VDI-Verl., 1993

Published in: Vakuumbeschichtung / Hrsg.: Gerhard Kienel ... ; 4
Behringer, Uwe [Editor] ; European Mask and Lithography Conference 37. 2022 Löwen, Gesellschaft Mikroelektronik, Mikrosystem- und Feinwerktechnik

37th European Mask and Lithography Conference : 20-23 June, 2022, Leuven, Belgium

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Bellingham, Washington, USA: SPIE, [2022]

Published in: SPIE: Proceedings of SPIE ; 12472
Behringer, Uwe [Editor]; Finders, Jo [Editor] ; European Mask and Lithography Conference 39. 2024 Grenoble, Gesellschaft Mikroelektronik, Mikrosystem- und Feinwerktechnik

39th European Mask and Lithography Conference (EMLC 2024) : 17-19 June 2024, Grenoble, France

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Bellingham, Washington, USA: SPIE, [2024]

Published in: SPIE: Proceedings of SPIE ; 13273
Behringer, Uwe [Editor]; Finders, Jo [Editor] ; European Mask and Lithography Conference 38. 2023 Dresden, Gesellschaft Mikroelektronik, Mikrosystem- und Feinwerktechnik

38th European Mask and Lithography Conference (EMLC 2023) : 19-21 June 2023, Dresden, Germany

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Bellingham, Washington, USA: SPIE, [2023]

Published in: SPIE: Proceedings of SPIE ; 12802
Behringer, Uwe [Editor]; Finders, Jo [Editor] ; European Mask and Lithography Conference 35. 2019 Dresden, Gesellschaft Mikroelektronik, Mikrosystem- und Feinwerktechnik, SPIE

35th European Mask and Lithography Conference (EMLC 2019) : 17-19 June 2019, Dresden, Germany

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Bellingham, Washington, USA: SPIE, [2019]

Published in: SPIE: Proceedings of SPIE ; 11177
Behringer, Uwe [Editor]; Finders, Jo [Editor] ; European Mask and Lithography Conference 34. 2018 Grenoble, Gesellschaft Mikroelektronik, Mikrosystem- und Feinwerktechnik, SPIE

34th European Mask and Lithography Conference : 18-20 June 2018, Grenoble, France

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Bellingham, Washington, USA: SPIE, [2018]

Published in: SPIE: Proceedings of SPIE ; 10775
Behringer, Uwe [Editor]; Finders, Jo [Editor] ; European Mask and Lithography Conference 33. 2017 Dresden, Gesellschaft Mikroelektronik, Mikrosystem- und Feinwerktechnik, SPIE

33rd European Mask and Lithography Conference : 26-28 June 2017, Dresden, Germany

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Bellingham, Washington, USA: SPIE, [2017]

Published in: SPIE: Proceedings of SPIE ; 10446
Behringer, Uwe [Editor]; Finders, Jo [Editor] ; European Mask and Lithography Conference 32. 2016 Dresden, Gesellschaft Mikroelektronik, Mikrosystem- und Feinwerktechnik

32nd European Mask and Lithography Conference : 21-22 June 2016, Dresden, Germany

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Bellingham, Washington, USA: SPIE, [2016]

Published in: SPIE: Proceedings of SPIE ; 10032
Behringer, Uwe [Editor]; Finders, Jo [Editor] ; EMLC 31. 2015 Eindhoven, Gesellschaft Mikroelektronik, Mikro- und Feinwerktechnik

31st European Mask and Lithography Conference : 22-23 June 2015, Eindhoven, Netherlands

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Bellingham, Washington, USA: SPIE, [2015]

Published in: SPIE: Proceedings of SPIE ; 9661
Eberle, Annette [Editor]; Kaminsky, Uwe [Editor]; Behringer, Luise [Editor]; Unterkofler, Ursula [Editor]

Menschenrechte und Soziale Arbeit im Schatten des Nationalsozialismus : Der lange Weg der Reformen - [2nd ed. 2023.]

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Wiesbaden: Springer Fachmedien Wiesbaden, 2023. ; Wiesbaden: Imprint: Springer VS, 2023.
Eberle, Annette [Editor]; Kaminsky, Uwe [Editor]; Behringer, Luise [Editor]; Unterkofler, Ursula [Editor]

Menschenrechte und Soziale Arbeit im Schatten des Nationalsozialismus : der lange Weg der Reformen

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Wiesbaden: Springer VS, [2019]

Published in: Springer eBook Collection
Jaramillo Segura, Sonia [Author]; Krisam, Johannes [Author]; Le Cornet, Lucian [Author]; Kratzmann, Markus [Author]; Baumann, Lukas [Author]; Sauer, Tim [Author]; Crysandt, Martina [Author]; Rank, Andreas [Author]; Behringer, Dirk [Author]; Teichmann, Lino [Author]; Görner, Martin [Author]; Trappe, Ralf-Ulrich [Author]; Röllig, Christoph [Author]; Krause, Stefan [Author]; Hanoun, Maher [Author]; Hopfer, Olaf [Author]; Held, Gerhard [Author]; Buske, Sebastian [Author]; Fransecky, Lars [Author]; Kayser, Sabine [Author]; Schliemann, Christoph [Author]; Schaefer-Eckart, Kerstin [Author]; Al-Fareh, Yousef [Author]; Schubert, Jörg [Author]; [...]

Rationale and design of the 2 by 2 factorial design GnG-trial : a randomized phase-III study to compare two schedules of gemtuzumab ozogamicin as adjunct to intensive induction therapy and to compare double-blinded intensive postremission therapy with or without glasdegib in older patients with newly diagnosed AML

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03 November 2021

Published in: Trials ; 22(2021), Artikel-ID 765, Seite 1-13
Behringer, Uwe F. W.

1x stencil masks fabrication and their use in Low-Energy Electron-beam Proximity Lithography (LEEPL)

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SPIE, 2004

Published in: SPIE Proceedings, 5567 (2004), Seite 864
Behringer, Uwe F. W.

Low-energy electron beam proximity projection lithography (LEEPL): the world's first e-beam production tool, LEEPL 3000

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SPIE, 2004

Published in: SPIE Proceedings, 5504 (2004), Seite 164
Fortagne, Olaf; Kern, Dieter P.; Behringer, Uwe

Preface

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Elsevier BV, 2001

Published in: Microelectronic Engineering, 57-58 (2001), Seite 1
Behringer, Uwe F. W.; Ehrlich, Christian; Fortange, Olaf

Future reticle demand and next-generation lithography technologies

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SPIE, 1999

Published in: SPIE Proceedings, 3665 (1999), Seite 1

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