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Konuma, Mitsuharu [Author]

Film deposition by plasma techniques : with 30 tables

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Berlin; Heidelberg [u.a.]: Springer, 1992

Published in: Springer series on atoms and plasmas ; 10
Lucovsky, Gerald [Editor]; Ibbotson, Dale E. [Editor]

Characterization of plasma-enhanced CVD processes : symposium held November 27 - 28, 1989, Boston, Masachusetts, U.S.A.

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Pittsburgh, Pa.: Materials Research Soc., 1990

Published in: Materials Research Society: Materials Research Society symposium proceedings ; 16500
Boyd, Ian W. [Editor] ; European Materials Research Society, Symposium on Photon, Beam and Plasma Assisted Processing Fundamentals and Device Technology 1988 Straßburg

Photon, beam and plasma assisted processing : proceedings of Symposium B on Photon, Beam and Plasma Assisted Processing Fundamentals and Device Technology of the 1988 E-MRS spring conference; Strasbourg, France, 31 May - 2 June 1988 - [Reprint.]

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Amsterdam [u.a.]: North-Holland, 1989

Published in: European Materials Research Society: European Materials Research Society symposia proceedings ; 2
Mäder, Gerrit [Author]

Atmosphärendruck-Plasma-Beschichtungsreaktoren

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Stuttgart: Fraunhofer-IRB-Verl., 2008
Bayer, Christian [Author]

Aufbringung von Siliziumoxidschichten durch Plasma-CVD und Anwendung auf Beschichtungen in einer Plasma-Wirbelschicht

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Düsseldorf: VDI Verl., 1998

Published in: Verein Deutscher Ingenieure: Fortschrittberichte VDI / 3 ; 534
Borer, Beat Urs [Author]

SiO X thin film deposition on particles by plasma enhanced chemical vapor deposition in a circulating fluidized bed reactor

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2005 ; Mikrofiche-Ausg.
Liepack, Harald [Author]

Darstellung und Charakterisierung von TiC/a-C-Hartstoff- und Titandisulfidschmierstoffschichten - [1. Aufl.]

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München: Verl. Dr. Hut, 2007

Published in: Werkstoffwissenschaften
Karches, Martin Josef [Author]

Plasma chemical vapor deposition of thin metal oxide films on particles in the riser of a circulating fluidized bed - [Als Ms. gedr.]

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Düsseldorf: VDI-Verl., 2002

Published in: Verein Deutscher Ingenieure: Fortschrittberichte VDI / 3 ; 719
Zimmermann, Thomas [Author]

High-rate growth of hydrogenated amorphous and microcrystalline silicon for thin-film silicon solar cells using dynamic very-high frequency plasma-enhanced chemical vapor deposition

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Jülich: Forschungszentrum Jülich, 2013

Published in: Forschungszentrum Jülich: Schriften des Forschungszentrums Jülich ; 183
Bekdüz, Bilge [Author] ; Bacher, Gerd [Degree supervisor]

Thermal and Plasma Enhanced Chemical Vapor Deposition of Graphene on Copper and Germanium

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Duisburg; Essen: Universität Duisburg-Essen, 2020
Pyeon, Myeongwhun [Author] ; Mathur, Sanjay [Other]; Wickleder, Mathias [Other]; Hwang, Tajin [Other]

Morphological and Structural Modification of Silicon, Titanium and Iron Oxides by Plasma Enhanced Chemical Vapor Deposition for Solar Water Splitting

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Köln: Universitäts- und Stadtbibliothek Köln, 2018
Osterkamp, Christian [Author] ; Universität Ulm

Engineering colour centres in tailored diamond

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Ulm, 2020
Okasha Mohamed Okasha, Asmaa Mohamed [Author] ; Weber, Eicke [Degree supervisor] Albert-Ludwigs-Universität Freiburg Fakultät für Angewandte Wissenschaften

Application of plasma-enhanced chemical vapor deposition in order to improve the efficiency of crstalline silicon solar cells

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Freiburg: Universität, 2020
Okasha Mohamed Okasha, Asmaa Mohamed [Author] ; Weber, Eicke [Degree supervisor] Albert-Ludwigs-Universität Freiburg Fakultät für Angewandte Wissenschaften

Application of plasma-enhanced chemical vapor deposition in order to improve the efficiency of crstalline silicon solar cells

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Freiburg: Universität, 2020
Osterkamp, Christian [Author]

Engineering colour centres in tailored diamond

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Ulm: Universität Ulm, 2021
Baier, Maximilian Paul [Author] ; Hirth, Thomas [Degree supervisor]

Plasmaunterstützte Gasphasenabscheidung (PE-CVD) von Multifunktionsschichten aus dem Precursorensystem Hexamethyldisiloxan/Sauerstoff

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Stuttgart: Universitätsbibliothek der Universität Stuttgart, 2016
Schmidt, Jan [Author]; Werner, Florian [Author]; Veith, Boris [Author]; Zielke, Dimitri [Author]; Steingrube, S. [Author]; Altermatt, Pietro P. [Author]; Gatz, Sebastian [Author]; Dullweber, Thorsten [Author]; Brendel, Rolf [Author]

Advances in the surface passivation of silicon solar cells - [published Version]

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http://www.repo.uni-hannover.de/handle/123456789/1366

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Amsterdam : Elsevier BV, 2012

Published in: Energy Procedia 15 (2012)
Wehmeier, Nadine [Author] ; Schmidt, Jan [Contributor]; Wietler, Tobias [Contributor]

Fabrication and analysis of co-diffused n-type silicon solar cells applying plasma-deposited diffusion sources - [published Version]

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https://www.repo.uni-hannover.de/handle/123456789/8944

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Hannover : Gottfried Wilhelm Leibniz Universität Hannover, 2016
Stöhr, Uwe [Author]

Development and applications of stamps for area-selective plasma treatment and plasma-enhanced coating

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2010
Veith, Boris [Author]; Werner, Florian [Author]; Zielke, Dimitri [Author]; Brendel, Rolf [Author]; Schmidt, Jan [Author]

Comparison of the thermal stability of single Al2O3 layers and Al2O3/SiNx stacks for the surface passiviation of silicon - [published Version]

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http://www.repo.uni-hannover.de/handle/123456789/1174

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Amsterdam : Elsevier BV, 2011

Published in: Energy Procedia 8 (2011)

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